MARZ
Filed: May 10, 1967
METALS AND ALLOYS OF HIGH PURITY
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 72271162
MRC
Filed: July 3, 1973
[ SPUTTERING SUBSTRATE MATERIALS SUCH AS ALUMINA IN THE FORM OF THIN PLATES, BOTH PLAIN (UNCOATED) AND METALLIZED ]
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 72462037
ALUSIL
Filed: May 23, 1974
HIGH PURITY ALUMINUM/SILICON ALLOYS IN THE FORM OF WIRE FILAMENTS, VAPOR DEPOSITION SLUGS, AND SPUTTERING TARGETS FOR USE…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 73022184
ALUCOP
Filed: May 23, 1974
HIGH PURITY ALUMINUM/COPPER ALLOYS IN THE FORM OF WIRE FILAMENTS, VAPOR DEPOSITION SLUGS, AND SPUTTERING TARGETS FOR USE…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 73022185
WAFERLINE
Filed: June 11, 1982
Automated Single Wafer Sputtering Apparatus, Comprising: Magnetron Cathode for Depositing Films, Film Deposition Chamber…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 73369093
PERMABONDING
Filed: August 17, 1989
STRUCTURALLY BONDING A SPUTTERING TARGET TO A BACKING PLATE
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 73819749
FOCEST
Filed: September 25, 1989
METAL SPUTTERING TARGETS FOR COATING METAL ON SUBSTRATES
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 73827702
SUPERSTEP
Filed: November 16, 1989
METALLIC SPUTTERING TARGETS FOR USE IN COATING METAL ON SEMICONDUCTOR SUBSTRATES
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74002010
VISION
Filed: December 26, 1989
Apparatus for treating articles such as semiconductors and related goods in a chamber at reduced pressure by subjecting…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74014313
GALAXY
Filed: July 31, 1991
semiconductor wafer processing equipment; namely, cluster tool apparatus incorporating a plurality of semiconductor wafer…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74190147
MRC
Filed: November 29, 1991
chemical vapor deposition apparatus
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74226031
MRC
Filed: July 24, 1992
apparatus for plasma process etching of microelectronic devices and for custom computer software for the control of apparatus…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74297574
PRIMUS
Filed: June 2, 1994
inorganic sputter targets for use in vacuum sputter deposition of inorganic coatings on substrates, and apparatus for vacuum…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74532343
PHOENIX
Filed: July 15, 1994
chemical vapor deposition apparatus
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74552595
EIGER
Filed: August 25, 1994
apparatus for vacuum plasma sputter deposition of inorganic coatings on substrates and vacuum plasma sputter etching of…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74565594
ASPEN
Filed: August 26, 1994
apparatus for vacuum plasma sputter deposition of inorganic coatings on substrates and vacuum plasma sputter etching of…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74566257
SOLARUS
Filed: November 21, 1994
inorganic sputter targets for use in vacuum sputter deposition of inorganic coatings on substrates, and apparatus for vacuum…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74601381
GMR-2000
Filed: January 17, 1995
substrate processing equipment, namely multi-module sputter deposition apparatus, and modules therefor, namely sputter coating…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74622195
WORLDPROCESS
Filed: July 13, 1995
high purity metallic and other inorganic material sputtering targets for use in vacuum coating of metallic and inorganic…
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 74700521
HIPERLINC
Inorganic sputter targets for use in vacuum sputter deposition of inorganic coatings on substrates
Owned by: MATERIALS RESEARCH CORPORATION
Serial Number: 75564549
