Semiconductor wafer inspection apparatus; analyzing apparatus for defect of semiconductor wafers; analyzing apparatus for stress of semiconductor wafers; analyzing apparatus for composition of semiconductor wafers; semiconductor wafer measuring apparatus; semiconductor wafer testing apparatus; semiconductor photomask inspection apparatus; analyzing apparatus for defect of semiconductor photomasks; analyzing apparatus for stress of semiconductor photomasks; analyzing apparatus for composition of semiconductor photomasks; semiconductor photomask measuring apparatus; semiconductor photomask testing apparatus; semiconductor reticle inspection apparatus; analyzing apparatus for defect of semiconductor reticles; analyzing apparatus for stress of semiconductor reticles; analyzing apparatus for composition of semiconductor reticles; semiconductor reticle measuring apparatus; semiconductor reticle testing apparatus; semiconductor substrate inspection apparatus; analyzing apparatus for defect of semiconductor substrates; analyzing apparatus for stress of semiconductor substrates; analyzing apparatus for composition of semiconductor substrates; semiconductor substrate measuring apparatus; semiconductor substrate testing apparatus; sensors for mapping semiconductor wafers; Raman spectrographic measurement apparatus, and parts and accessories therefor; Raman spectroscopic analyzing apparatus, and parts and accessories therefor; measuring apparatus for measuring film thickness; measuring apparatus for spectral measurements; automated optical inspection apparatus; X-ray fluorescence measuring apparatus; measuring or testing machines and instruments, and parts and accessories therefor; photoluminescence or fluorescence microscope spectrometers, and parts and accessories therefor; photoluminescence or fluorescence microscope spectrographs, and parts and accessories therefor; optical machines and apparatus; photographic machines and apparatus; cinematographic machines and apparatus; laboratory apparatus and instruments; computer software for inspection, defect analysis, stress analysis, composition analysis, measurement and testing of semiconductor wafers, photomasks, reticles and substrates; computer software; computer programs; scanning probe microscopes; X-ray fluorescence analyzing apparatus; electronic computer and data processing machines and apparatus and their parts; power distribution or control machines and apparatus; rotary converters; phase modifiers; batteries and cells; electric or magnetic meters and testers; electric wires and cables; spectacles [eyeglasses and goggles]; life-saving apparatus and equipment; telecommunication machines and apparatus; fire alarms; gas alarms; water leak alarms; oil leak alarms; anti-theft warning apparatus.