Auxiliary fluids for use with abrasives in the semiconductor industry; chemical slurries for polishing semiconductors and mechanical electronic substrates; chemical mechanical planarization slurry for semiconductors and mechanical electronic substrates; ceria slurries for abrading semiconductor for industrial purposes; epoxy resins, unprocessed; unprocessed acrylonitrile butadiene styrene resins; unprocessed styrene acrylonitrile resins; unprocessed phenolic resins; unprocessed polyallylate resins; unprocessed polyamide resins; unprocessed polyester resins; unprocessed polymethyl metacrylate resins; plasma, exposed, or etching gasses, namely, silane gas, dichlorosilane gas, disilane gas, nitrogen trifluoride gas, and tungsten hexafluoride gas for processing semiconductors and for semiconductor manufacturing processes

Semiconductor wafer processing machines; wet cleaning machines for manufacture of semiconductors for research and development; semiconductor processing machines; chemical mechanical polishing apparatus for semiconductor wafer; abrasive machine for semiconductor wafer; semiconductor wafer support processing equipment and machines; semiconductor processing equipment for research and development; wet cleaning equipment for manufacture of semiconductors; cleaning machines for semiconductor wafer; deposition equipment in the nature of organic light emitting diode wet stations for manufacture of semiconductors and LCDs, namely, wet stations for use to clean, etch, strip, rinse, and dry semiconductor wafers and LCDs; vacuum pump for manufacture of semiconductors; modified chemical vapor deposition machine for manufacturing semiconductors; power-driven cleaning scrubbers for manufacturing semiconductors; gas cabinet filters and purifier for machines for manufacturing semiconductors, namely, filters and purifiers for removing contaminants from gases used in the semiconductor industry; cleaning equipment for LCD industry and supplies, namely, cleaning machines for LCD parts and components; manufacturing machines for liquid crystal display devices; photoresist coating machines; substrate surface plasma etching and cutting machines; cleaning machines for flat panel display using CO2; gas supply valves being parts of machines

Computer aided design of molds; design of machinery; design of machines and apparatus; design of semiconductors; design of integrated circuit; research on construction technology; quality control for others; design of parts of machines; mechanical drawing services; research relating to mechanical engineering; mechanical research; chemistry consultation services; chemical research and analysis; chemical research; product analysis, namely, product failure analysis services; product testing; product quality testing services relating to product stability