Confocal scanning microscopes; optical inspection apparatus for industrial use for inspection of semiconductor materials, namely, photomasks and reticles silicon wafers and mask blanks in the nature of blank optical plate; phase-shift mask measurement system for photomask comprising optical measurement unit in the nature of optical measuring sensors, mask stages in the nature of optical stages for reflection and transmission measurements of flat substrates, electronic controller and computer; wafer inspection system comprised of optical inspection apparatus, wafer stages in the nature of stages for semiconductor wafers, electronic controller, and computer; wafer measurement system comprised of optical measurement apparatus, wafer stages in the nature of stages for semiconductor wafers, electronic controller and computer; substrate inspection system comprised of optical inspection apparatus, substrate stage in the nature of optical stages for reflection measurement of flat substrates, electronic controller, and computer; PV cell measurement system comprised of solar simulator, measurement unit in the nature of electronic sensors for measuring solar radiation, cell stages in the nature of stages for measurement of flat substrates, electronic controller and computer; coating thickness scanning system for lithium ion batteries comprised of coating thickness measuring gauge ; pellicle inspection apparatus in the nature of an optical inspection apparatus that inspects a pellicle film of a mask provided with a pellicle and used in EUV lithography