WONIK IPS - Trademark Details
Status: 706 - A Section 71 declaration has been accepted
Serial Number
79103531
Registration Number
4204134
Word Mark
WONIK IPS
Status
706 - A Section 71 declaration has been accepted
Status Date
2018-06-22
Filing Date
2011-03-16
Registration Number
4204134
Registration Date
2012-09-11
Mark Drawing
3000 - Illustration: Drawing or design which also includes word(s)/ letter(s)/number(s)
Typeset
Design Searches
260126 - Spirals, coils and swirls.
Published for Opposition Date
2012-06-26
Law Office Assigned Location Code
M80
Employee Name
MITTLER, ROBIN M
Statements
Certificate of Correction for Registration
In the statement, Page 1, line 8, after "APPARATUS" FOR MANUFACTURING LCD/PDP/SEMICONDUCTOR/LCD/SOLAR CELLS/AMOLED DISPLAY/LED;" should be inserted. In the statement, Page 1, line 8, through line 11, "ATOMIC LAYER DEPOSITION APPARATUS, ION BEAM DEPOSITION APPARATUS, ION BEAM ETCHING APPARATUS, ANNEALING APPARATUS, RAPID THERMAL PROCESSING APPARATUS, COUPLED SPUTTERING APPARATUS," should be deleted. In the statement, Page 1, line 11, through line 17, after "APPARATUS" FOR MANUFACTURING LCD/PDP/SEMICONDUCTOR/LCD/SOLAR CELLS/AMOLED DISPLAY/LED;" should be inserted. In the statement, Page 1, line 14, through line 15, "ION BEAM ETCHING APPARATUS," should be deleted. In the statement, Page 1, line 17, "ELECTRON BEAM ANNEALING APPARATUS," should be deleted.
Indication of Colors claimed
The color(s) blue, red and gray is/are claimed as a feature of the mark.
Desription of the Colors Claimed
Blue appears in the word 'WONIK' and red appears in the word 'IPS' and gray appears in the figure inside a character 'O'.
Description of Mark
The mark consists of the stylized wording "WONIK" in blue, the stylized letters "IPS" in red, and a gray circular design inside the character "O".
Goods and Services
Semiconductor manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, coupled plasma chemical vapor deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, atomic layer deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, annealing apparatus, rapid thermal processing apparatus, ] low temperature annealing apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, coupled sputtering apparatus, ] multiple sputtering apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * laser sublimation deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * organic molecular chemical vapor deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * ion beam generation apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * ion beam sputter deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, ion beam etching apparatus, ] ion beam assisted deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * electron beam assisted deposition apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * electron beam crystallization apparatus * for manufacturing LCD/PP/semiconductor/LCD/solar cells/GAMBOLED display/LED; * [, electron beam annealing apparatus, ] oxidation mechanical apparatus, ion implantation apparatus, chemical vapor precipitation mechanical apparatus, sputtering mechanical apparatus, and probe [ ; liquid crystal display manufacturing equipment, namely, film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus, sputtering mechanical apparatus, and probe; organic electrocutions display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; plasma display panel manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, and annealing apparatus; solar cell manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, rapid thermal processing apparatus, ion beam deposition apparatus, ion beam etching apparatus and annealing apparatus; light emitting diode (LED) manufacturing equipment, namely, thin film deposition apparatus, chemical vapor deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus, ion beam etching apparatus, electron beam annealing apparatus; micro electromechanical systems (ME MS) manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, evaporation deposition apparatus and chemical vapor deposition apparatus; active matrix light emitting diode (GAMBOLED) display manufacturing equipment, namely, thin film deposition apparatus, sputtering apparatus, coupled sputtering apparatus, etching apparatus, evaporation deposition apparatus, plasma chemical vapor deposition apparatus, ion beam deposition apparatus and ion beam annealing apparatus ]
Goods and Services
Installation, repair and maintenance of semiconductor processing machines, semiconductor wafer processing apparatus, atomic layer deposition apparatus, low pressure chemical vapor deposition apparatus, diffusion furnaces, plasma chemical vapor deposition apparatus, metal organic chemical vapor deposition apparatus, fast-heating processing apparatus, high temperature chemical vapor deposition apparatus, vapor Keita apparatus, liquid Keita apparatus, normal pressure chemical vapor deposition apparatus, mid pressure chemical vapor deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of semiconductors [ ; installation, repair and maintenance of deposition apparatus etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of liquid crystal display panels; installation, repair and maintenance of deposition apparatus, etchers for manufacturing solar cells, sputtering apparatus, photolithography apparatus, developers for manufacturing solar cells, bashing apparatus, cleaning apparatus and polishing apparatus, all for the manufacture of solar cells; maintenance of deposition apparatus, etchers, sputtering apparatus, photolithography apparatus, developers, bashing apparatus, cleaning apparatus, and polishing apparatus, all for the manufacture of LED and GAMBOLED displays ]
Translation of Words in Mark
The wording "WONIK" has no meaning in a foreign language.
Classification Information
International Class
007 - Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements (other than hand-operated); incubators for eggs. - Machines and machine tools; motors and engines (except for land vehicles); machine coupling and transmission components (except for land vehicles); agricultural implements (other than hand-operated); incubators for eggs.
US Class Codes
013, 019, 021, 023, 031, 034, 035
Class Status Code
6 - Active
Class Status Date
2011-10-28
Primary Code
007
International Class
037 - Building construction; repair; installation services. - Building construction; repair; installation services.
US Class Codes
100, 103, 106
Class Status Code
6 - Active
Class Status Date
2011-10-28
Primary Code
037
Current Trademark Owners
Party Name
Party Type
31 - 1st New Owner Entered After Registration
Legal Entity Type
99 - Other (limited company (ltd.)).
Address
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Trademark Owner History
Party Name
Party Type
31 - 1st New Owner Entered After Registration
Legal Entity Type
99 - Other (limited company (ltd.)).
Address
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Party Name
Party Type
30 - Original Registrant
Legal Entity Type
99 - Other (Limited Company).
Address
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Party Name
Party Type
20 - Owner at Publication
Legal Entity Type
99 - Other (Limited Company).
Address
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Party Name
Party Type
10 - Original Applicant
Legal Entity Type
99 - Other (Limited Company).
Address
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Correspondences
Name
Jun-Hwa Jeong
Address
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International Registrations
International Registration Number
1093207
International Registration Date
2011-03-16
International Publication Date
2011-11-03
International Renewal Date
2031-03-16
Auto Protection Date
2019-04-12
International Status
001 - Request for extension of protection established
International Status Date
2011-10-27
Priority Claimed In
True
Priority Claimed Date
2011-03-10
First Refusal In
True
Trademark Events
| Event Date | Event Description |
| 2011-10-27 | SN ASSIGNED FOR SECT 66A APPL FROM IB |
| 2011-10-28 | NEW APPLICATION OFFICE SUPPLIED DATA ENTERED IN TRAM |
| 2011-10-28 | ASSIGNED TO EXAMINER |
| 2011-11-01 | APPLICATION FILING RECEIPT MAILED |
| 2011-11-04 | NON-FINAL ACTION WRITTEN |
| 2011-11-05 | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW |
| 2011-11-08 | NON-FINAL ACTION (IB REFUSAL) WITHDRAWN FOR REVIEW |
| 2011-11-14 | FAX RECEIVED |
| 2011-11-14 | NON-FINAL ACTION WRITTEN |
| 2011-11-15 | NON-FINAL ACTION (IB REFUSAL) PREPARED FOR REVIEW |
| 2011-11-15 | REFUSAL PROCESSED BY MPU |
| 2011-11-15 | NON-FINAL ACTION MAILED - REFUSAL SENT TO IB |
| 2011-12-19 | REFUSAL PROCESSED BY IB |
| 2011-12-30 | CHANGE OF NAME/ADDRESS REC'D FROM IB |
| 2012-04-03 | TEAS CHANGE OF CORRESPONDENCE RECEIVED |
| 2012-04-03 | TEAS RESPONSE TO OFFICE ACTION RECEIVED |
| 2012-04-13 | ASSIGNED TO LIE |
| 2012-04-19 | CORRESPONDENCE RECEIVED IN LAW OFFICE |
| 2012-04-19 | TEAS/EMAIL CORRESPONDENCE ENTERED |
| 2012-05-14 | APPROVED FOR PUB - PRINCIPAL REGISTER |
| 2012-05-21 | LAW OFFICE PUBLICATION REVIEW COMPLETED |
| 2012-06-06 | NOTIFICATION OF NOTICE OF PUBLICATION E-MAILED |
| 2012-06-06 | NOTICE OF START OF OPPOSITION PERIOD CREATED, TO BE SENT TO IB |
| 2012-06-06 | NOTIFICATION OF POSSIBLE OPPOSITION SENT TO IB |
| 2012-06-26 | PUBLISHED FOR OPPOSITION |
| 2012-06-26 | OFFICIAL GAZETTE PUBLICATION CONFIRMATION E-MAILED |
| 2012-09-11 | REGISTERED-PRINCIPAL REGISTER |
| 2012-12-10 | NOTIFICATION PROCESSED BY IB |
| 2012-12-11 | FINAL DISPOSITION NOTICE CREATED, TO BE SENT TO IB |
| 2012-12-17 | FINAL DISPOSITION PROCESSED |
| 2012-12-17 | FINAL DISPOSITION NOTICE SENT TO IB |
| 2013-01-07 | FINAL DECISION TRANSACTION PROCESSED BY IB |
| 2015-07-31 | LIMITATION OF GOODS RECEIVED FROM IB |
| 2015-11-05 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
| 2015-11-05 | CORRECTION UNDER SECTION 7 ¿ PROCESSED |
| 2015-11-06 | LIMITATION FROM THE IB EXAMINED AND ENTERED |
| 2016-07-05 | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED |
| 2016-07-05 | INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE |
| 2016-07-21 | CHANGE OF OWNER RECEIVED FROM IB |
| 2017-09-11 | COURTESY REMINDER - SEC. 71 (6-YR) E-MAILED |
| 2017-10-13 | LIMITATION OF GOODS RECEIVED FROM IB |
| 2017-10-13 | CORRECTION TRANSACTION RECEIVED FROM IB |
| 2017-10-13 | CORRECTION TRANSACTION RECEIVED FROM IB |
| 2017-10-13 | CORRECTION TRANSACTION RECEIVED FROM IB |
| 2017-10-16 | CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED |
| 2017-10-23 | CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED |
| 2017-10-23 | CORRECTION FROM THE IB EXAMINED, NO ACTION IS NEEDED |
| 2017-11-16 | LIMITATION FROM THE IB EXAMINED, NO ACTION IS NEEDED |
| 2018-04-30 | TEAS SECTION 71 RECEIVED |
| 2018-05-11 | CASE ASSIGNED TO POST REGISTRATION PARALEGAL |
| 2018-06-22 | REGISTERED-SEC.71 ACCEPTED |
| 2018-06-22 | NOTICE OF ACCEPTANCE OF SEC. 71 - E-MAILED |
| 2019-02-22 | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED |
| 2019-03-27 | INVALIDATION PROCESSED |
| 2019-03-27 | PARTIAL INVALIDATION OF REG EXT PROTECTION SENT TO IB |
| 2019-05-03 | PARTIAL INVALIDATION PROCESSED BY THE IB |
| 2019-11-27 | PARTIAL INVALIDATION OF REG EXT PROTECTION CREATED |
| 2019-12-17 | INVALIDATION REVIEWED - NO ACTION REQUIRED BY OFFICE |
| 2021-04-30 | INTERNATIONAL REGISTRATION RENEWED |
| 2021-09-11 | COURTESY REMINDER - SEC. 71 (10-YR) E-MAILED |
