CHEMICAL PRODUCTS NAMELY, DIAMOND-LIKE CARBON, SUPPORTING MEDIA FOR USE IN THE MANUFACTURE OF MAGNETIC RECORDING MEDIA AND MICROELECTRONIC APPLICATIONS IN THE NATURE OF HARD DISKS, MRAMS (MAGNETIC RANDOM ACCESS MEMORIES) OR THIN FILM TRANSISTORS (TFTS); NITROGENATED AMORPHOUS CARBON AND CARBON NITRIDE FOR USE IN THE STORAGE MEDIA INDUSTRY; STOICHIOMETRIC SILICON DIOXIDE FOR USE IN THE OPTICAL COATING INDUSTRY; SUBSTOICHIOMETRIC SILICON DIOXIDE FOR USE IN THE SEMICONDUCTOR INDUSTRY; SILICON NITRIDE FOR USE IN THE SEMICONDUCTOR INDUSTRY; SILICON OXYNITRIDES FOR USE IN THE OPTICAL COATING AND SEMICONDUCTOR INDUSTRY; POLYCRYSTALLINE SILICON FOR USE IN THE SOLAR CELL INDUSTRY; POLYCRYSTALLINE DIAMOND FOR USE IN THE TOOL INDUSTRY; YTTRIA STABILIZED ZIRCONIA FOR USE IN THE ELECTRONIC INDUSTRY; ALUMINUM BASED COMPOUNDS, ESPECIALLY AL203 AND ALOX FOR USE IN THE OPTICAL COATING AND STORAGE MEDIA INDUSTRY; CHEMICALS FOR USE ON MODIFIED SURFACES, FOR THE DRY ETCHING OF SEMICONDUCTORS AND FOR USE IN THE TREATMENT OF POLYMERIC SURFACES, MEMBRANES AND PAINTS, ADHESIVES OR COSMETICS; CHEMICALS IN THE NATURE OF THROUGHPUT PREPARATIONS, NAMELY HARDENING, CORROSION AND WEAR RESISTANCE PREPARATIONS FOR ULTRASHALLOW JUNCTIONS, CONFORMAL DOPING OF TRENCH STRUCTURES, GETTERS, ETCH-STOP LAYERS, AND FOR CAVITIES AND LIGHT EMITTING STRUCTURES FOR USE IN THE ELECTRONICS AND SEMICONDUCTOR INDUSTRY; CHEMICALS IN THE NATURE OF PLASMA STERILIZATION PREPARATIONS FOR TREATMENT OF PACKING MATERIALS FOR USE IN THE FOOD AND BEVERAGE INDUSTRY; CHEMICALS IN THE NATURE OF POLYMER COATINGS FOR THE IMPROVEMENT OF ENZYME ANCHORING FOR BIOCHEMICAL REACTIONS FOR SCIENTIFIC RESEARCH USE

LACQUERS IN THE NATURE OF COATINGS FOR METAL FOR USE ON TOOLS, INSTRUMENTS AND CAR PARTS; PROTECTIVE TRANSPARENT COATINGS FOR USE ON GLASS AND PLASTIC, ESPECIALLY BAR CODE SCANNERS AND SUNGLASSES; OPTICAL COATINGS FOR USE IN THE MANUFACTURE OF LASER MIRRORS, DICHROIDIC LAYERS AND OPTICAL MULTIPLAYERS; ANTIREFLECTIVE OPTICAL COATINGS FOR USE IN THE MANUFACTURE OF OPAQUE AND HEAT RESISTANT PROJECTOR GLASSES; COATINGS FOR USE IN THE MANUFACTURE OF SURGICAL IMPLANTS AND ORTHOPEDIC PROSTHESIS WITH ENHANCED BIOCOMPATIBILITY AND WEAR RESISTANCE

INDUSTRIAL LUBRICANTS, ESPECIALLY NITROGENATED AMORPHOUS CARBON AND CARBON NITRIDE, AND POLYCHRYSTALLINE DIAMOND

MEDICATED LOTIONS WITH ENHANCED OLIGODYNAMIC PROPERTIES FOR TREATING BURNS AND OTHER INJURIES

CASTING ALLOYS, NAMELY TITANIUM BASED ALLOYS, ESPECIALLY TiN, TiAIN AND TiCN, ALUMINUM BASED ALLOYS

MACHINES AND TOOL MACHINES, NAMELY FOR DRY ETCHING OF SEMICONDUCTOR DEVICE STRUCTURES, FOR WETTABILITY CONTROL OF POLYMERIC SURFACES, FABRICS, GLASS AND PAPER, ION IMPLANTATION, AND FOR APPLICATION OF VACUUM COATINGS

LASERS FOR PLASMA DIAGNOSTICS NOT FOR MEDICAL USE; FOCUSED PLASMA ION BEAM INSTRUMENTS FOR IMAGING AND MEASUREMENTS; EQUIPMENT FOR RECORDING, TRANSFER AND REPRODUCTION OF SOUND AND DISPLAYS, NAMELY, AUDIO TAPE RECORDERS, VIDEO TAPE RECORDERS AND EVENT RECORDERS; DATA PROCESSORS; COMPUTERS, BLANK MAGNETIC RECORDING MEDIA, NAMELY, MAGNETIC RECORD TAPES AND CASSETTES; BAR CODE SCANNERS; FLAT PANEL DISPLAYS; MAGNETIC RECORDING MEDIA WITH DIAMOND-LIKE CARBON AND MODIFIED SURFACES, NAMELY, BLANK AUDIOTAPES AND BLANK VIDEOTAPES; SEMICONDUCTORS DRY-ETCHED WITH OPTICAL COATINGS, NAMELY LASER MIRRORS, OPTICAL MULTILAYERS AND HEAT RESISTANT PROJECTOR GLASSES

MACHINES FOR THE PLASMA STERILIZATION OF MEDICAL INSTRUMENTS

MATERIAL TREATMENT, PLASMA PROCESSING AND SURFACE TREATMENT, NAMELY DRY ETCHING OF SEMICONDUCTOR DEVICE STRUCTURES, SURFACE CLEANING AND REMOVAL OF OXIDES AND CONTAMINANTS; REACTIVE ETCHING, SPUTTERING AND TREATMENT OF POLYMERIC SURFACES; APPLICATIONS OF AGENTS TO CONTROL WETTABILITY OF POLYMERIC SURFACES, FABRICS, GLASS AND PAPER; DOPING FORMATION OF ULTRASHALLOW JUNCTIONS AND CONFORMAL DOPING OF TRENCH STRUCTURES, CUSTOM MANUFACTURE OF SEMICONDUCTOR COMPONENTS, NAMELY SEEDING FOR PLANARIZED SELECTIVE METAL DEPOSITION AND FORMATION OF MULTILEVEL INTERCONNECTS OF METAL IMPURITIES; FORMATION OF GETTERING LAYERS BY INTRODUCTION OF NOBLE GASES, HYDROGEN, ISOLECTRONIC ELEMENTS AND DOPANT SPECIES, FORMATION OF SILICON-ON-INSULATOR STRUCTURES, FORMATION OF ETCH-STOP LAYERS FOR SILICON MICROMACHINING, AND FORMATION OF HYDROGEN AND HELIUM INDUCED CAVITIES FOR LIGHT EMITTING; PLASMA STERILIZATION OF MEDICAL INSTRUMENTS AND MATERIALS; PLASMA STERILIZATION OF PACKING MATERIALS; AND VACUUM COATING OF MEMBRANES AND SENSORS BY CATHODIC ARC DEPOSITION

PROVIDING TEMPORARY USE OF ON-LINE NON-DOWNLOADABLE SOFTWARE FOR USE IN DATA PROCESSING; TECHNICAL CONSULTING IN THE FIELD OF CHEMISTRY, PHYSICS AND GEOLOGY; PERFORMING OF TECHNICAL ANALYSIS IN THE FIELD OF PLASMA DIAGNOSTICS; PERFORMING OF CHEMICAL ANALYSIS; SCIENTIFIC AND INDUSTRIAL RESEARCH, PROVIDING SCIENTIFIC REPORTS AND PLASMA ION BEAM DIAGNOSTICS FOR OTHERS; PROVIDING INFORMATION IN THE FIELD OF CHEMISTRY AND PHYSICS OVER A GLOBAL COMMUNICATION NETWORK