CHEMICALS AND CHEMICAL PREPARATIONS, PARTICULARLY FOR USE IN PHOTOGRAPHY, PHOTOENGRAVING, LITHOGRAPHY, ROTARY PHOTOGRAVURE AND OTHER PHOTOMECHANICAL AND RELATED ARTS-NAMELY, ACIDS, SALTS, BASES, SENSITIZERS, SOLVENTS, SYNTHETIC OR ANILINE DYES, RESINS, RESISTS (MATERIAL FOR FORMING A SURFACE COATING TO RESIST AN ETCHING MORDANT), [ ALBUMEN, WAXES, ] ETCHING POWDER, DYE REMOVER, RETOUCHING DYE, ALCOHOLS, DYE SOLUTIONS, ACID SULPHITE SOLUTION, TALCUM FOR PHOTOENGRAVING USE, DEVELOPERS FOR PHOTOGRAPHIC PAPER AND FILM AND COMPONENT CHEMICALS, DEVELOPERS FOR PHOTOMECHANICAL RESISTS, COLD TOP ENAMEL PROTECTOR (A SUBSTANCE TO BE APPLIED TO A PARTIALLY ETCHED PLATE TO REENFORCE A DEVELOPED COLD TOP ENAMEL RESIST), COLD TOP ENAMEL REMOVER (A SUBSTANCE FOR DISSOLVING OR REMOVING DEVELOPED PHOTOSENSITIVE RESISTS FROM AN ETCHED SURFACE), [ COLLODION, DRAGON'S BLOOD IN THE FORM OF A PREPARED RESIN FOR POTOENGRAVING USE, ] PHOTOGRAPHIC FIXER, FILM TEMPERING SOLUTIONS, GLASS PRINT STAIN, [ LIQUID FRISKET (A LIQUID MASKING MATERIAL TO BE APPLIED TO COPY AND LATER REMOVED WITHOUT DAMAGE TO THE COPY), HARDENER TABLETS (TABLETS OF CHEMICALS FOR PREPARING SOLUTIONS FOR HARDENNING PHOTOGRAPHIC EMULSIONS), ] HYPO, SODIUM THIOSULFATE, AMMONIUM THIOSULFATE, CONCENTRATED ACID FIXING SOLUTIONS, NEGATIVE VARNISH, HOT TOP ENAMEL, SENSITIZED PHOTOMECHANICAL RESIST (A COATING SOLUTION TO FORM A PHOTOSENSITIVE MORDANT RESISTING COATING IN PHOTOENGRAVING), STRIPPING SOLUTIONS TEMPERING SOLUTIONS, TOPPING POWDER [POWDERED RESIN, SODIUM THIOSULFATE, AMMONIUM THIOSULFATE, CONCENTRATED ACID FIXING SOLUTIONS, NEGATIVE VARNISH, HOT TOP ENAMEL, SENSITIZED PHOTOMECHANICAL RESIST (A COATING SOLUTION TO FORM A PHOTOSENSITIVE MORDANT RESISTING COATING IN PHOTOENGRAVING), STRIPPING SOLUTIONS, TEMPERING SOLUTIONS, TOPPING POWDER] (POWDERED RESINOUS MATERIAL TO BE APPLIED TO THE INKED SURFACE OF A PLATE IN PHOTOENGRAVING TO STRENGTHEN THE MORDANT RESISTANT QUALITIES OF THE INK), TINT PRINT SOLUTION, AND SURPRINT SOLUTIONS