Atomic layer deposition machine comprised of a reaction chamber, precursor lines and a cabinet, all sold as a unit for performing atomic deposition layering and for use in applying atomic layer coating on various surfaces, namely, on gate dielectrics, gate electrodes, metal interconnects, diffusion barriers, DRAM, multilayer-capacitors, read heads, antireflection, optical filters, OLED layers, photonic crystals, transparent conductors, electroluminescence, solar cells, lasers, integrated optics, MEMS, etch resistance, hydrophobic/antistiction, blade edges, molds and dies, solid lubricants, anti-corrosion, inside pores, nanotubes, around particles AFM tips, chemicals, catalysis, fuel cells, roll to roll, internal tube liners, nano-glue, biocompatible materials, medical devices, medical implantable devices, timed-drug released materials, coatings of anti-bacterial agents onto surfaces, anti-clotting coatings, and magnetics or for use as combined with a semiconductor wafer processing machine as a dual purpose unit